Sputter Coater Turbo-Pumped Dual Target, KQ300T‐D

Created by Kathleen Patrick, Modified on Fri, 17 May at 5:16 PM by Kathleen Patrick

This user note covers all the models for KQ300T‐D

Quick Overview

The KQ300T‐D is a fully automatic, free‐standing sputter coater ideally suited for thin film applications and for conductive coating of scanning electron microscopy (SEM) specimens.

At the operational heart of the KQ300T‐D is a large chamber fitted with two independent sputtering heads. This dual‐head configuration allows two different metals to be sequentially sputtered without the need to 'break' vacuum. A dual channel film thickness monitor option is available.

The system is designed to sputter a wide range of oxidising metals, eg chromium (Cr) and aluminium (Al), and non‐oxidising (noble) metals, eg gold (Au) and platinum (Pt).

The KQ300T‐D sputter coater has a 300mm x 127mm work chamber and a specimen stage that accepts substrates of 2‐4" wafer sizes as standard and 6" wafers with an optional stage accessory. An optional extended height glass chamber is available to enable coating of larger specimens.

Key Features

Fully automatic touch screen control ‐ rapid data input, simple operation
Customer‐defined coating protocols
Dual sputter head ‐ for sequential sputtering of two different metals, ideal for many thin film applications
A wide range of oxidising and non‐oxidising targets are available
Fine grain sputtering ‐ for advanced high resolution FE‐SEM applications
Large chamber format
Coat logging ‐ details of the last 100 coatings available on screen
Optional dual channel film thickness monitor (FTM) module
High‐vacuum turbo pumping
Automatic vacuum control ‐ can be pre‐programmed to suit the process and material, no needle valve to adjust
Vacuum shut‐down feature ‐ leaves the process chamber under vacuum when not in use ‐ improved vacuum performance
Thick film capabilities ‐ up to 60 minutes sputtering time without breaking vacuum
Ergonomic one‐piece moulded case ‐ easy maintenance and service access
Ethernet with local FTP server connection ‐ simple programmer updates
Power factor correction ‐ complies with the current legislation (CE Certification) ‐ efficient use of power means reduced running costs
Three‐year warranty

Ideal for sputter coating large specimens, thin film applications and SEM/FE‐SEM

The KQ300T‐D is suitable for sputtering a range of oxidising and non‐oxidising (noble) metals for scanning electron microscopy (SEM) and thin film applications. The range of target materials available is extensive ‐ see Ordering Information. The
KQ300T‐D comes as standard with a chromium (Cr) target and gold (Au) target.

High‐vacuum turbomolecular pumping

The KQ300T‐D is fitted with an internally mounted 70L/s turbomolecular pump, backed by a 50L/m two‐stage rotary pump (order separately). A Pirani vacuum measurement gauge (range: 1,000mbar to 5x10^‐4mbar) is included, but a full range gauge (1,000mbar to 5x10^‐9mbar) is available as an option. Typical ultimate vacuum of around 5x10^‐5mbar can be expected in a clean system after pre‐pumping with dry nitrogen gas.

Dual head sputtering ‐ for sequential sputtering

The KQ300T‐D is fitted with two independent sputtering heads to allow sequential sputtering of two different metals without the need to 'break' vacuum, for example, a thin 'seeding' layer of chromium (Cr) followed by deposition of gold (Au). An automatic shutter mechanism is fitted to enable cleaning of oxidising sputter targets and to protect the second target and substrate during coatings. For single metal applications, one target can be selected.

Specimen stages

The KQ300T‐D is fitted with a flat rotating specimen stage capable of accepting wafers up to 4"/100mm in diameter. The rotation speed is variable between preset limits and the stage to sputtering head distance can be adjusted between 25‐71mm. A range of optional specimen stages can be fitted ‐ see Options and Accessories.

Moulded case with colour touch screen

The KQ300T‐D is presented in a custom moulded, one‐piece case, allowing easy servicing access. The colour touch screen allows multiple users to input and store coating 'recipes'. The case houses all the working components and includes an automatic bleed control that ensures optimum vacuum conditions during sputtering.

The vacuum chamber has an internal diameter of 283mm/12" and comes with an integral implosion guard. The KQ300T‐D can also be fitted with optional 'vacuum shutdown', which enhances vacuum performance by allowing the chamber vacuum to be maintained when the system is not in use.

Rapid data entry

At the operational heart of the KQ300T‐D is a simple colour touch screen, which allows even the most inexperienced or occasional operator to rapidly enter and store their own process data. To further aid ease of use a number of typical sputter coating profiles are already stored. For added convenience, summaries of the last 100 coatings carried out can be viewed.

Maintenance

The intuitive touch screen interface features maintenance prompts that highlight:

Time of last clean
Coating time since last cleaned
System 'on time'
Time of last service.

Additional Information

Options and Accessories (including details of standard specimen stage)

Specimen stages:

The KQ300T‐D has specimen stages to meet most requirements. All are easy‐change, drop‐in style (no screws) and are height adjustable (except rotary planetary stage). Rotation speed is variable between 14‐38 RPM:

* Flat rotation stage for 4"/100mm wafers ‐ fitted as standard
* Flat rotation stage for 6"/150mm wafers
* Rotation stage ‐ 50mm ?. This stage only rotates ‐ no tilt or height adjustment
* Rotate‐tilt stage ‐ 50mm ? with height adjustment (target to stage height variable between 30‐80mm). The tilt angle can be pre‐set (horizontal to 30°)
* Rotation stage for glass microscope slides.

Other options:

* Extended height chamber for taller specimens
* Dual channel film thickness monitor (FTM). The optional FTM attachment (10779) consists of a controller and quartz crystal oscillator built into the KQ300T‐D and a vacuum feed‐through, two chamber‐mounted crystal holders and quartz crystals. As sputtered material is deposited onto the crystal, its frequency of oscillation is modified. This 'modification' is used to measure and control the thickness of material deposited.

Specifications

Instrument case	585mm W x 470mm D x 410mm H (total height with coating head open: 650mm)
Weight	36.6kg
Packed dimensions	725mm W x 660mm D x 680mm H (44.8kg)
Work chamber	Borosilicate glass 283mm ID x 127mm H
Safety shield	Integral polyethylene terephthalate (PET) cylinder
Display	145mm W x 320mm D x 240mm H colour graphic thin film transistor (TFT) display
User interface	Intuitive full graphical interface with touch screen buttons, includes features such as a log of the last 100 coatings carried out and reminders for when maintenance is due
Sputter target	Disc style 57mm ? with thickness depending on the targets fitted. One 57mm ? x 0.3mm thick chromium (Cr) target (TK8845) and one 57mm ? x 0.1mm thick gold (Au) target (SC502‐314A) fitted as standard.
Vacuum
High vacuum pumping	Internally‐mounted, 70L/s air‐cooled turbomolecular pump
Rotary pump	50L/m two‐stage rotary pump with oil mist filter (order separately, see page V4 and K6)
Vacuum measurement	Pirani gauge (a full range gauge is available as an option)
Typical ultimate vacuum	5x10^‐5mbar in a clean system after pre‐pumping with dry nitrogen gas
Specimen stage	Flat rotation stage for 4"/100mm wafers is fitted as standard. Rotation speed is variable between preset limits. For alternative stages see Options and Accessories
Processes
Sputtering	0‐80mA to a pre‐determined thickness (with the optional FTM) or by the built‐in timer. The maximum sputtering time is 60 minutes (without 'breaking' vacuum and with built‐in rest periods)
Services and other information
Gases	Argon sputtering process gas, 99.999%
	Nitrogen venting gas (optional)
Electrical supply	90‐250V 50/60Hz 1,400VA including RV3 rotary pump power. 110/240V voltage selectable
Conformity	CE conformity: Power factor correction. Complies with the current legislation (CE Certification) and ensures efficient use of power, resulting in reduced running costs

Ordering Information

KQ300T‐D	KQ300T‐D Dual Target Sequential Sputtering System. Includes one 57mm ? x 0.3mm chromium (Cr) target (TK8845) and one 57mm ? x 0.1mm thick gold (Au) target (SC502‐314A). A flat rotation stage for 4"/100mm wafers is included
Rotary pump requirements (needs to be ordered separately)
	50L/s two‐stage rotary pump, with vacuum hose, coupling kit and oil mist filter. (order separately, see page V4 and K6)
11540	Diaphragm pump. A 'dry' alternative to the standard oil‐based rotary pump. Complete with vacuum hose, coupling kit and oil mist filter
Options and accessories
10994	Rotating specimen stage to accept 4"/100mm or 6"/150mm wafers, with rotation variable between preset limits
10357	Rotating 50mm ? specimen stage with adjustable tilt. The platform has six specimen stub positions for 15mm, 10mm, 6.5mm or 1/8" pin stubs. The stage rotation speed is variable between preset limits. The target to stage height is variable between 0‐42mm for standard stage. When used with the extended height cylinder (optional accessory 10596) the target to stage height would be an additional 87mm
10067	50mm ? variable height specimen stage with six stub positions for 15mm, 10mm, 6.5mm disc stubs or 1/8" pin stubs. Stage rotation speed variable between preset limits. NB: Target to stage height is variable between 10‐53mm for standard stage. The stage is supplied with two mounting pillars; one provides 10‐32mm target to stage distance, the other 31‐53mm target to stage distance. An adjustable stop is used to set the height. When used with the extended height cylinder (optional accessory) the target to stage height would be an additional 87mm
10360	50mm ? rotary tilting stage. A rotary planetary style stage with variable tilt angle from horizontal to 30°. The platform has six positions for either 15mm, 10mm, 6.5mm disc stubs or 1/8" SEM pin stubs. Rotation speed is variable between preset limits. NB: Depending on specimen height, this stage may require the optional extended height cylinder
10358	90mm ? specimen stage for glass microscope slides (up to two x 75mm x 25mm slides or a single 75mm x 50mm slide). The stage can alternatively accommodate up to six 1/8" SEM pin stubs. The stage rotation speed is variable between preset limits. Includes a gear box to allow the optional FTM to be used
10779	Dual channel film thickness monitor (FTM). A fully integrated system using the KQ300T‐D touch screen display for the control and display of all FTM functions. Allows automatic termination of the sputtering process at preselected thickness values. Displays rate for sputtering processes in nm/m, with a resolution of 0.1nm. Two FTM crystal holders are fixed in the chamber to give optimal position for both targets and to coat one material per crystal. Operating crystal frequency in the 5MHz to 400kHz operating range. Includes two spare C5460 quartz crystals
C5460	Spare quartz crystal
10596	Extended height vacuum chamber (214mm H ‐ the standard chamber is 127mm H). For increased source to specimen distance and for coating large specimens
10442	Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the KQ300T‐D when bench depth is limited
11223	A lockable emergency stop (e‐stop) switch which can be mounted on top of the system in a position easily accessible for the operator. It is provided with a key to release the knob after activation. NB: The addition of the e‐stop does not inhibit or replace the normal on/off switch function. The e‐stop can be retrofitted to existing systems
10428	Full range, active vacuum gauge capable of measurement over the range of 1,000mbar to 5x10^‐9mbar. Typical ultimate vacuum of the KQ300T‐D is 5x10^‐5mbar. NB: Must be factory fitted
10576	Coating shields. Can be fitted to protect large surfaces from unwanted coating deposition ‐ easily removable for ease of cleaning
11288	Spares kit, including: spare standard glass cylinder, 54mm x 0.3mm chromium (Cr) target (TK8845) and 57mm x 0.1mm gold (Au) target (SC502‐314A), vacuum tubing with coupling insert, argon gas tubing, two sputter head magnets, rotary pump oil mist filter, FTM quartz crystal and fuses
Sputter targets	NB: The KQ300T‐D is fitted as standard with a 54mm x 0.3mm chromium (Cr) target (TK8845) and 57mm x 0.1mm gold (Au) target (SC502‐314A). Other optional targets are available

Links

For information on the KQ150T, and the sputter and carbon coating techniques, visit the Preparation Techniques and Advantages page.

To view sputter and carbon coating images, visit the Image Gallery.