CDMS 1T Representative Traceability Certificate

Created by Kathleen Patrick, Modified on Mon, 13 May at 1:02 PM by Kathleen Patrick

CDMS‐ 1T, 2mm ‐ 1µm, Traceable

Product Description: 2.5x2.5mm Critical Dimension Magnification Standard

Wafer Identifier: CD‐PG01

The accuracy of these products was determined by reference comparison to working standards traceable to the National Institute of Standards and Technology (NIST), Test No. 861/280822‐11.

Line	Average pitch of wafer	Number of lines averaged	Average pitch uniformity (1σ uncertainty)	Total expanded uncertainty (3σ) average pitch for wafer*
2.0mm	2.01mm	2	± 4µm (±0.20%)	± 7µm (±0.35%)
1.0mm	1.00mm	2	± 2µm (±0.20%)	± 3.5µm (±0.35%)
0.5mm	0.500mm	2	± 1µm (±0.20%)	± 1.75µm (±0.35%)
0.25mm	0.250mm	2	± 0.5µm (±0.20%)	± 0.9µm (±0.35%)
10µm	10.01µm	9	± 0.02µm (±0.20%)	± 0.035µm (±0.35%)
5µm	5.00µm	10	± 0.01µm (±0.20%)	± 0.0175µm (±0.35%)
2µm	2.00µm	10	± 0.007µm (±0.35%)	± 0.014µm (±0.7%)
1µm	1.00µm	10	± 0.0035µm (±0.35%)	± 0.007µm (±0.7%)

* The 3σ uncertainty (95% confidence interval) average pitch is determined using a minimum of nine die per production wafer. Each average pitch is determined using 100 measurements on each die averaged over the stated number of lines. The total expanded uncertainty includes both Type A and Type B uncertainties corrected for sample size using an appropriate Student t‐factor.

Equipment used:

Instrument	Model number	Serial number	Resolution	Repeatability
FE‐SEM	FEI Quanta 3D FEG	D8894	1.2nm	0.03%

This certificate shall not be reproduced without permission.

682‐1 TN VPG‐01 09162011