Sputter Coater, KQ150R

Created by Karen Darley, Modified on Mon, 27 May at 10:08 AM by Kathleen Patrick

This user note covers all the models for KQ150R

Quick Overview

The KQ150R is a compact rotary pumped coating system ideally suited for SEM and other coating applications.

The KQ150R is available in three formats:

KQ150R S - a compact rotary pumped sputter coater, suitable for non-oxidising metals
KQ150R E - a compact rotary pumped carbon fibre coater suitable for SEM applications
KQ150R ES - a compact rotary pumped combined sputter coater and carbon evaporator

Key Features

Metal sputtering or carbon evaporation - or both - in one space saving design
Rotary pumped sputter coating - allows sputtering of a wide range of non-oxidising (noble) metals, such as gold (Au), platinum (Pt), silver (Ag) and palladium (Pd)
Carbon fibre coating - ideal for SEM carbon coating applications (eg EDS and WDS)
Advanced design carbon evaporation gun - simple operation, reproducible results
Glow discharge option - for modification of sample surface properties (eg hydrophobic to hydrophilic conversion) or for cleaning / removal of contaminating surface residues
Control of evaporation current profile - ensures consistently reproducible carbon films
Repeatable thickness control using the film thickness monitor option
Fully automatic touch screen control - rapid data input, simple operation
Multiple, customer defined coating protocols can be stored - ideal for multi-user labs
Automatic vacuum control, which can be pre-programmed to suit the process and material - no needle valve to adjust
"Intelligent" recognition system - automatically detects the type of coating insert fitted
Easy-to-change, drop-in style specimen stages (rotation stage as standard)
Thick film capabilities - up to 60 minutes sputtering time without breaking vacuum
Ergonomic one piece moulded case - easy maintenance and service access
Ethernet with local FTP server connection - simple programmer updates
Power factor correction - complies with current legislation (CE Certification) - efficient use of power means reduced running costs
Three-year warranty

Product Description

Ideal for SEM applications

KQ150R is available in three formats: sputtering, carbon evaporation or both. Depending upon the selected configuration, the KQ150R can be a top-of-the-range sputter coater for scanning electron microscopy (SEM), a carbon coater suitable for SEM (eg EDS and WDS), or both, in a single easy to use system.

Moulded case with colour touch-screen

The KQ150R is presented in a custom moulded, one-piece case. The colour touch screen allows multiple users to input and store coating protocols. The case houses all the working components. Automatic bleed control ensures optimum vacuum conditions during sputtering. The vacuum chamber has an external diameter of 165mm (6.5") and comes with an integral implosion guard. A variable speed rotary specimen stage is fitted as standard, with other stages available as options.

Sputter coating, carbon coating or both

The KQ150R is available in three formats, each with a range of optional accessories:

KQ150R S - a compact rotary pumped sputter coater, suitable for non-oxidising (noble) metals. A wide selection of sputtering targets is available
KQ150R E - a compact rotary pumped carbon fibre coater suitable for SEM applications (eg EDS and WDS). The system uses carbon fibre / cord as standard.
KQ150R ES - a combined system with both sputtering and carbon fibre coating. The deposition inserts can be swapped in seconds and the intelligent system logic automatically recognises which insert is in place and displays the appropriate operating settings.

Each of the above can be fitted with a range of optional accessories (eg glow discharge, carbon rod coating, film thickness monitor).

Rapid data entry

At the operational heart of KQ150R is a simple colour touch screen, which allows even the most inexperienced or occasional operators to rapidly enter and store their own process data. To further aid ease of use a number of typical sputtering and evaporation profiles are already stored.

Maintenance

The intuitive touch screen interface features maintenance prompts which highlight:

Time of last clean
Coating time since last cleaned
System 'on time'
Time of last service

Additional Information

Glow Discharge Attachment

The primary application of glow discharge is as a technique for the surface modification, or 'wetting', of newly-evaporated transmission electron microscopy (TEM) carbon support films.

Hydrophilisation

Freshly-made TEM carbon support films tend to have hydrophobic surfaces which inhibits the spreading of suspensions of particles in negative staining solutions. However, after glow discharge treatment with air, the carbon film is made hydrophilic and negatively charged, thus allowing easy spreading of aqueous suspensions. With subsequent magnesium acetate treatment the surface is made hydrophilic and positively charged.

In addition to glow discharge treatment using air, other process gases may be used to modify surface properties. For example, methanol as a process gas results in the surface becoming hydrophobic and negatively charged. Such treatment can facilitate the optional absorption of selected biomolecules

Options and Accessories (including details of coating head inserts and specimen stages that are fitted as standard)

Coating head options

A range of interchangeable, plug-in style coating head inserts are available:

Sputtering head insert - suitable for non-oxidising (noble) metals. Supplied with a 57mm x 0.1mm thick gold (Au) target as standard (R S and R ES versions). For additional targets see Ordering Information
Additional sputter head inserts - available for quick coating material change (R S and R ES versions)
Carbon fibre evaporation head insert - fitted as standard to R E and R ES versions
Carbon rod evaporation head insert - for 3.05mm rods (available as an option for R E and R ES versions).

Specimen stages

The KQ150R has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except rotary planetary stage):

Rotation stage - 50mm (supplied as standard). This stage only rotates - no tilt or height adjustment
Rotate-tilt stage - 50mm with height adjustment (target to stage height variable between 37-60mm). Tilt angle can be pre-set (up to 90°)
Variable angle 'Rotacota' rotary planetary stage - with 50mm specimen platform
Flat rotation stage for 100mm/4" wafers
Rotation stage for glass microscope slides.

Other options

Extended height chamber - for tall specimens
Film thickness monitor (FTM) - the optional FTM attachment (10454) consists of a controller and quartz crystal oscillator built into the KQ150R and a vacuum feed-through, chamber-mounted crystal holder and quartz crystal. As sputtered or evaporated material is deposited onto the crystal, so its frequency of oscillation is modified. This 'modification' is used to measure and control the thickness of material deposited.

Specifications

Instrument case	585mm W x 470mm D x 410mm H (total height with coating head open: 650mm)
Weight	28.4kg
Packed dimensions	725mm W x 660mm D x 680mm H (37kg)
Work chamber	Borosilicate glass 152mm ID x 127mm H
Safety shield	Integral polyethylene terephthalate (PET) cylinder
Display	145mm x 320mm x 240mm colour graphic thin film transistor (TFT) display
User interface	Intuitive full graphical interface with touch screen buttons, includes features such as a log of the last 10 coatings carried out and reminders for when maintenance is due
Sputter target	Disc style 57mm x 0.1mm thick gold (Au) target (SC502-314A) is fitted as standard. R S/R ES versions only
Vacuum
Rotary pump	50L/m two-stage rotary pump with oil mist filter (order separately, see EK3175)
Vacuum measurement	Pirani gauge
Typical ultimate vacuum	2x10^-2mbar in a clean system after pre-pumping with dry nitrogen gas
Specimen stage	50mm rotation stage. Rotation speed 8-20 RPM. For alternative stages see Options and Accessories
Processes
Sputtering	0-80mA to a pre-determined thickness (with optional FTM) or by the built-in timer. The maximum sputtering time is 60 minutes (without 'breaking' vacuum and with built-in rest periods)
Carbon evaporation	A robust, ripple free DC power supply featuring pulse evaporation ensures reproducible carbon evaporation from rod or fibre sources. Current pulse: 1-90A
Glow discharge	Operates at 100mA in DC mode and 30mA in DC- mode
Services and other information
Gases	Argon sputtering process gas, 99.999% (R S and R ES versions)
	Nitrogen venting gas (optional)
Electrical supply	90-250V 50/60Hz 1,400VA including RV3 rotary pump power. 110/240V voltage selectable
Conformity	CE conformity: Power factor correction. Complies with the current legislation (CE Certification) and ensures efficient use of power, which means reduced running costs

Ordering Information

KQ150R S	10417	Rotary pumped sputter coater, includes an SC502-314A 57mm x 0.1mm gold target
Inserts and accessories fitted as standard	10587	Quick-release sputter insert for KQ150R S and KQ150R ES - suitable for non-oxidising (noble) metals. Supplied with SC502-314A 57mm x 0.1mm thick gold target as standard. For additional noble metal targets (eg Platinum, Gold / Palladium, Silver) see Sputtering Targets section
Inserts and accessories fitted as standard	10067	Rotation stage, 50mm with adjustable height for target to sample distances of 38mm-79mm (supplied with 2 mounting pillars). Note: this stage does not tilt - for tilting stage see Specimen Stages section
KQ150R E	10419	Rotary pumped carbon fibre evaporator, supplied with carbon fibre / cord
Inserts and accessories fitted as standard	10355	Quick-release carbon fibre evaporation insert for KQ150R E and KQ150R ES - suitable for evaporation of carbon fibre and carbon cord
Inserts and accessories fitted as standard	10067	Rotation stage, 50mm with adjustable height for target to sample distances of 38mm-79mm (supplied with 2 mounting pillars). Note: this stage does not tilt - for tilting stage see Specimen Stages section
KQ150R ES	10418	Rotary pumped sputter coater, includes an SC502-314A 57mm x 0.1mm gold target, and carbon fibre evaporator, supplied with carbon fibre / cord
Inserts and accessories fitted as standard	10587	Quick-release sputter insert for KQ150R S and KQ150R ES - suitable for non-oxidising (noble) metals. Supplied with SC502-314A 57mm x 0.1mm thick gold target as standard. For additional noble metal targets (eg Platinum, Gold / Palladium, Silver) see Sputtering Targets section
	10355	Quick-release carbon fibre evaporation insert for KQ150R E and KQ150R ES - suitable for evaporation of carbon fibre and carbon cord
	10067	Rotation stage, 50mm with adjustable height for target to sample distances of 38mm-79mm (supplied with 2 mounting pillars). Note: this stage does not tilt - for tilting stage see Specimen Stages section
Rotary pump requirements (needs to be ordered separately)		50L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter.
Options and accessories	10879	Carbon rod evaporation insert for 3.05mm rods (R E and R ES only). Includes S8651 manual rod shaper and C5422 (3.05mm x 300mm pack of ten) carbon rods
	10262	Glow discharge insert. Used to modify surface properties (eg hydrophobic to hydrophilic conversion) (R S and R ES versions only). Can be retrofitted
	10726	Additional sputter insert for quick metal change (R E and R ES versions only). This is an entire sputtering assembly; individual targets can also be purchased
	10360	Variable angle 'Rotacota' rotary planetary specimen stage (rotational speed 8-20 RPM). 50mm specimen platform with six stub positions for 15mm, 10mm, 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8-20 RPM
	10357	Variable tilt angle specimen stage with adjustable tilt up to 90°. 50mm specimen platform with six stub positions for 15mm, 10mm, 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8-20 RPM
	10458	Flat rotation specimen stage for 100mm/4" wafers, includes gear box for increased coverage. Stage rotation speed variable between 8-20 RPM
	10358	90mm specimen stage for glass microscope slides (up to two x 75mm x 25mm slides). Stage rotation speed variable between 8-20 RPM. Includes gear box to allow optional FTM to be used
	10454	Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and quartz crystals
	10429	Extended height vacuum chamber (214mm in height - the standard chamber is 127mm high). For increased source to specimen distance and for coating large specimens
	10731	Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the KQ150R when bench depth is limited
Sputter targets	The KQ150R S and KQ150R ES are fitted as standard with a 0.1mm thick gold (Au) target (SC502-314A). A wide variety of other targets is available
Sputter targets
Carbon supplies	Carbon fibre/cord, graphite rods and rod shapers
Other consumables and spare kits
	Metal evaporation baskets and boats

Links

For information on the KQ150T, and the sputter and carbon coating techniques, visit the Quorum Preparation Techniques and Advantages page.